Chemical-Mechanical Polishing – Fundamentals and Challenges: Volume 566 (Bog, Hardback, Engelsk)
  1. Forside
  2. Bøger
  3. Engelske bøger
  4. Elektronisk udstyr og materialer
  5. Materialelære
  6. Chemical-Mechanical Polishing – Fundamentals and Challenges:...

Chemical-Mechanical Polishing – Fundamentals and Challenges: Volume 566

(Bog, Hardback, Engelsk)
Chemical-Mechanical Polishing – Fundamentals and Challenges: Volume 566
Forlag: Materials Research Society

Bemærk: Kan ikke leveres før jul.

Når du handler på WilliamDam.dk, betaler du den pris du ser.

  • Ingen gebyrer
  • Ingen abonnementer
  • Ingen bindingsperioder

Relaterede kategorier

Elektronisk udstyr og materialer Materialelære
  = Emner / kategorier
  = Sektioner / guides
  = Specialsider
  = Kampagner

Beskrivelse

This book brings together many of the active players in the field to focus on the interdisciplinary nature of these challenges. It reflects, to some extent, the role played by both academic institutions and multinational corporations in opening up the frontiers in the field of CMP for wider dissemination. Both experimental and theoretical contributions are included.

Læsernes anmeldelser (0)

Alle detaljer

Forlag Materials Research Society
Type Bog
Format Hardback
Sprog Engelsk
Udgivelsesdato 10-02-2000
Første udgivelsesår 2000
Serie MRS Proceedings
Illustrationer Worked examples or Exercises
Fagredaktør S. V. (Clarkson University Babu, S. (Georgia Institute of Technology) Danyluk, M. (IBM T J Watson Research Center Krishnan, M. Tsujimura
Originalsprog United States
Sideantal 296
Indbinding Hardback
Forlag Materials Research Society
Sideoplysninger 296 pages, Worked examples or Exercises
Mål 234 x 157 x 23
ISBN-13 / EAN-13 9781558994737