High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs)

(Bog, Paperback / softback, Engelsk)

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This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS).

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Forlag Apple Academic Press Inc.
Type Bog
Format Paperback / softback
Sprog Engelsk
Udgivelsesdato 01-07-2022
Første udgivelsesår 2022
Illustrationer 18 Tables, black and white; 24 Illustrations, color; 79 Illustrations, black and white
Fagredaktør Niladri (Mizoram University Pratap Maity, Reshmi (Mizoram University Maity, Srimanta (National Institute of Technology Baishya
Originalsprog Canada
Sideantal 264
Indbinding Paperback / softback
Forlag Apple Academic Press Inc.
Sideoplysninger 264 pages, 18 Tables, black and white; 24 Illustrations, color; 79 Illustrations, black and white
Mål 151 x 228 x 18
ISBN-13 / EAN-13 9781774638859