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Forventes på lager: 11-01-2007
Brings together materials science, manufacturing processes, and research and developments of SiGe and strained-Si. This book contains the information on strain engineering in silicon CMOS and strained-Si-based integrated circuit technology and strain-engineered MOSFETs. It presents various aspects of silicon heterostructure materials and devices.
| Forlag | Taylor & Francis Ltd |
| Forfattere | C.K Maiti, S Chattopadhyay, L.K Bera |
| Type | Bog |
| Format | Hardback |
| Sprog | Engelsk |
| Udgivelsesdato | 11-01-2007 |
| Første udgivelsesår | 2007 |
| Serie | Series in Materials Science and Engineering |
| Illustrationer | 29 Tables, black and white; 18 Halftones, black and white; 299 Illustrations, black and white |
| Originalsprog | United Kingdom |
| Sideantal | 436 |
| Indbinding | Hardback |
| Forlag | Taylor & Francis Ltd |
| Sideoplysninger | 436 pages, 29 Tables, black and white; 18 Halftones, black and white; 299 Illustrations, black and w |
| Mål | 234 x 156 |
| ISBN-13 / EAN-13 | 9780750309936 |